“Great for keeping the skin hydrated without causing future breakouts.”
This intensive, rejuvenating moisturizer is formulated with pharmaceutical-grade botanicals, peptides, and powerful antioxidants. Reparative Moisture Emulsion helps keep your skin healthy, smooth, and protected.
- Smooths and hydrates the skin
- Helps reduce the appearance of fine lines and wrinkles
- Provides both deep and surface hydration
- Helps prevent environmental damage with Extremozyme technology
- Excellent moisturizing prep for makeup (created in conjunction with leading makeup artists)
- Great for all skin types including oily and sensitive skin
Apply a small amount to clean skin, smoothing evenly over face and neck.
Pollution-Related Free Radical Damage
8-isoprostane levels are a measure of free radical damage. These increase in the presence of pollution – especially very aggressive pollution particles. Pollution (like DPM 2.5) damages skin, accelerates skin aging, increases the frequency and severity of skin symptoms and increases the incidence of other systemic diseases. Application of Reparative Moisture Emulsion prior to pollution exposure prevented much of the pollution-related free radical damage
Water/Aqua/Eau, Sodium Hyaluronate, Glycerin, Squalane, Caprylic/Capric Triglyceride, Tocopherol, Panthenyl Triacetate, Ethyl Linoleate, Butylene Glycol, Acetyl Tyrosine, Proline, Lecithin, Glycosaminoglycans, Beta Vulgaris (Beet) Root Extract [Extrait de racine de betterave], Haberlea Rhodopensis Leaf Extract, Xanthan Gum, Carbomer, Triethanolamine, Urea, Glucose, Guanidine HCl, Cetearyl Alcohol, Ceteareth-20, Dimethicone, Yeast Extract/Faex/Extrait de levure, Dipalmitoyl Hydroxyproline, Cyclomethicone, Hydrolyzed Vegetable Protein, Hydrolyzed Soy Protein, Tripeptide-10 Citrulline, Tripeptide-1, Polysorbate 40, Superoxide Dismutase, PVP, Panthenol, Phospholipids, Retinyl Palmitate, Tocopheryl Acetate, Ascorbyl Palmitate, Pantothenic Acid, Ethylbisiminomethylguaiacol Manganese Chloride, 1,2-Hexanediol, Caprylyl Glycol, Disodium EDTA.